Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
US6965153B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2001 |
| Grant date | Nov 15, 2005 |
| Priority date | — |
| Expiry date | Oct 3, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31774
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This invention relates to an electrooptic system array having a plurality of electron lenses. The electrooptic system array includes upper, middle, and lower electrodes arranged along the paths of a plurality of charged-particle beams, the upper, middle, and lower electrodes having pluralities of apertures on the paths of the plurality of charged-particle beams, an upper shield electrode which is interposed between the upper and middle electrodes and has a plurality of shields corresponding to the respective paths of the charged-particle beams, and a lower shield electrode which is interposed between the lower and middle electrodes and has a plurality of shields corresponding to the respective paths of the charged-particle beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.