Computer-implemented method and carrier medium configured to generate a set of process parameters for a lithography process
US6968253B2 · kind B2 · utility
42Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 7, 2003 |
| Grant date | Nov 22, 2005 |
| Priority date | — |
| Expiry date | May 31, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A computer-implemented method and a carrier medium adapted to generate a set of process parameter values for a lithography process based upon both critical dimension and overlay effect analyses of process parameter value variations is provided. In some cases, the computer-implemented method and a carrier medium may be configured to select a set of process parameter values to collectively minimize the number critical dimension and overlay variation errors produced within an image fabricated from the lithography process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.