Methods of calibrating and controlling stepper exposure processes and tools, and system for accomplishing same
US6972853B1 · kind B1 · utility
5Cited by
13References
51Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2002 |
| Grant date | Dec 6, 2005 |
| Priority date | — |
| Expiry date | Oct 15, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention is generally directed to various methods of stepper exposure processes and tools, and system for accomplishing same. In one embodiment, the method comprises forming a grating structure comprised of a plurality of photoresist features above a semiconducting substrate, measuring at least one characteristic of at least one of the photoresist features at a plurality of locations within the grating structure, and determining if the measured characteristic of the photoresist features varies across the grating structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.