RF metrology characterization for field installation and serviceability for the plasma processing industry
US6983215B2 · kind B2 · utility
34Cited by
21References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 2, 2003 |
| Grant date | Jan 3, 2006 |
| Priority date | — |
| Expiry date | Dec 24, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for field substitution of components of a RF metrology system. The system includes a sensor/cable combination and an analysis unit. Parameters of the RF metrology system are determined prior to placing the RF metrology system in the field. From these parameters, either component, the cable/sensor combination or the analysis module, may be substituted in the field by recalibrating the system for the substituted unit. Such recalibration is carried out utilizing the parameters determined prior to placing the RF metrology system in the field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.