Catadioptric optical system and exposure apparatus having the same

US6985286B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• David Shafer · Fairfield, US
• Helmut Beierl · Heidenheim, DE
• Gerhard Furter · Ellwangen, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Wilhelm Ulrich · Aalen, DE

Key dates

• Filing date: Feb 25, 2004
• Grant date: Jan 10, 2006
• Expiry date: Feb 25, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70275
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.