System and method for dose control in a lithographic system
US6989920B2 · kind B2 · utility
1Cited by
29References
40Claims
0Family size
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Key dates
| Filing date | May 29, 2003 |
| Grant date | Jan 24, 2006 |
| Priority date | — |
| Expiry date | Nov 19, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.