Electron beam inspection system and inspection method and method of manufacturing devices using the system
US6992290B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 2, 2001 |
| Grant date | Jan 31, 2006 |
| Priority date | — |
| Expiry date | Dec 30, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.