Particle measurement configuration and semiconductor wafer processing device with such a configuration

US7000454B2 · kind B2 · utility

Assignees

• Infineon Technologies AG · DE
• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Claus Schneider · Burgsinn, DE
• Ralph Trunk · Hallstadt, DE
• Lothar Pfitzner · Erlangen, DE
• Heinz Schmid · Thalwil, CH

Key dates

• Filing date: Sep 3, 2002
• Grant date: Feb 21, 2006
• Expiry date: Feb 29, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2015/1024
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.