Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus
US7000622B2 · kind B2 · utility
30Cited by
17References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2003 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Aug 10, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system and method for processing an edge of a substrate includes an edge roller and a first proximity head. The first proximity head being mounted on the edge roller. The first proximity head capable of forming a meniscus and including a concave portion and multiple ports opening into the concave portion. The concave portion being capable of receiving an edge of a substrate and the ports including at least one process liquid injection port, at least one vacuum port and at least one surface tension control port.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.