Maskless fabrication of waveguide mirrors
US7001788B2 · kind B2 · utility
14Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 2004 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | May 28, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12104
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a waveguide mirror that involves etching a trench in a silicon substrate; depositing a film (e.g. silicon dioxide) over the surface of the silicon substrate and into the trench; ion etching the film to remove at least some of the deposited silicon dioxide and to leave a facet of film in inside corners of the trench; depositing a layer of SiGe over the substrate to fill up the trench; and planarizing the deposited SiGe to remove the SiGe from above the level of the trench.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.