Floating gate nitridation
US7001810B2 · kind B2 · utility
11Cited by
26References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2004 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Jan 30, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/035
Abstract
The floating gate, or the oxide between the floating and control gates, or both are nitrided before the control gate layer is deposited.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.