Illumination system particularly for microlithography

US7006595B2 · kind B2 · utility

Assignee

• Carl Zeiss Semiconductor Manufacturing Technologies AG · DE

Inventors

• Wolfgang Singer · Aalen, DE
• Jorg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Udo Dinger · Oberkochen, DE
• Martin Antoni · Aalen, DE
• Joachim Wietzorrek · Aalen, DE
• Joachim Hainz · Aalen, DE

Key dates

• Filing date: May 17, 2002
• Grant date: Feb 28, 2006
• Expiry date: May 17, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/062
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.