Patent · US Expired

Method and apparatus for minimizing agglomerate particle size in a polishing fluid

US7014539B1 · kind B1 · utility

1Cited by
5References
19Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 18, 2004
Grant dateMar 21, 2006
Priority date
Expiry dateNov 18, 2024

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B21/00
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An apparatus and method for minimizing the size of agglomerated particles in a polishing fluid is provided. The method includes positioning a polishing pad between a sacrificial member and a support member such that the sacrificial member is in communication with the polishing pad, thereby causing the agglomerated particles to separate. The apparatus includes a polishing pad and a polishing fluid condition. The polishing fluid conditioner includes a sacrificial member and a support member, wherein the sacrificial member is in communication with the polishing pad so as to cause the agglomerated particles to separate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.