Robert Charatan
16Patents
5h-index
20Co-inventors
62Inventor score
Filing activity: Dec 20, 2002 → Aug 15, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6955588B1 | Method of and platen for controlling removal rate characteristics in chemical mechanical planarization | Performing Operations; Transporting | 29 | Expired |
| US8340827B2 | Methods for controlling time scale of gas delivery into a processing chamber | Emerging Cross-Sectional Technologies | 28 | Active |
| US6935938B1 | Multiple-conditioning member device for chemical mechanical planarization conditioning | Performing Operations; Transporting | 13 | Expired |
| US7695632B2 | Critical dimension reduction and roughness control | Emerging Cross-Sectional Technologies | 8 | Active |
| US7004825B1 | Apparatus and associated method for conditioning in chemical mechanical planarization | Performing Operations; Transporting | 8 | Expired |
| US6958005B1 | Polishing pad conditioning system | Performing Operations; Transporting | 5 | Expired |
| US8268118B2 | Critical dimension reduction and roughness control | Emerging Cross-Sectional Technologies | 5 | Active |
| US7205226B1 | Sacrificial layer for protection during trench etch | Electricity | 4 | Expired |
| US6752898B1 | Method and apparatus for an air bearing platen with raised topography | Performing Operations; Transporting | 4 | Expired |
| US6899594B1 | Relative lateral motion in linear CMP | Performing Operations; Transporting | 2 | Expired |
| US8614149B2 | Critical dimension reduction and roughness control | Emerging Cross-Sectional Technologies | 2 | Active |
| US7479457B2 | Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof | Physics | 1 | Expired |
| US8529728B2 | System and method for critical dimension reduction and pitch reduction | Physics | 1 | Active |
| US7014539B1 | Method and apparatus for minimizing agglomerate particle size in a polishing fluid | Performing Operations; Transporting | 1 | Expired |
| US7442649B2 | Etch with photoresist mask | Electricity | 1 | Active |
| US7427458B2 | System and method for critical dimension reduction and pitch reduction | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.