Patent · US Expired

Method and apparatus for defect detection

US7016028B2 · kind B2 · utility

4Cited by

1References

21Claims

0Family size

Assignee

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW · BE

Inventors

Frank Holsteyns · Steenokkerzeel, BE
Francesca Iacopi · Leuven, BE
Karen Maex · Herent, BE

Key dates

Filing date	Jun 9, 2003
Grant date	Mar 21, 2006
Priority date	—
Expiry date	Aug 15, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG01N21/9501
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for determining the presence of defects in a covering layer overlying an underlying layer in accordance with an embodiment of the invention comprises providing a substrate comprising the covering layer, where the covering layer is at least partially exposed. The covering layer is subjected to a first substance, such as a solvent, and then subjected to a light beam. An optical property of the covering layer is determined and compared with a threshold value. The presence of defects in the covering layer is determined by the difference of the optical property from the threshold value, where the optical property indicates a level of penetration of the first substance through the covering layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.