Systems and methods for ion beam focusing
US7019314B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 2004 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Oct 18, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/147
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods are provided for focusing a scanned ion beam in an ion implanter. A beam focusing system is provided, comprising first and second magnets providing corresponding magnetic fields that cooperatively provide a magnetic focusing field having a time-varying focusing field center generally corresponding to a time-varying beam position of a scanned ion beam along a scan direction. Methods are presented, comprising providing a focusing field having a focusing field center in the scan plane, and dynamically adjusting the focusing field such that the focusing field center is generally coincident with a time-varying beam position of the scanned ion beam along the scan direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.