System and method for inspecting a component using interferometry
US7019841B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 19, 2003 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Dec 19, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0608
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for inspecting a component is provided. The system includes an interferometer having a coated mirror, such as a coating that allows only a fraction of light to pass, where the coating has a predetermined thickness. An interference inspection system receives reflected light from the component through the interferometer and determines whether interference is occurring at each of two or more predetermined areas, such as at point corresponding to a bump contact and at a second point corresponding to a substrate. The thickness of the coating is related to a height difference between two or more of the predetermined areas, such as by creating interference at both areas by changing the reflection path length by an amount required to cause simultaneous interference fringing for a designed height difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.