Method and apparatus for determining chemistry of part's residual contamination
US7020583B2 · kind B2 · utility
3Cited by
4References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2004 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Feb 13, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electronic monitoring device that archives chemical exposures of a consumable part inside a semiconductor processing tool. The monitoring device includes a memory unit dedicated to the consumable part and which stores a history of the chemical exposures of the consumable part, a processor in communication with the memory unit, and a power supply circuit that supplies power to the processor and the memory unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.