Patent · US Expired

PVD method and PVD apparatus

US7022209B2 · kind B2 · utility

5Cited by

4References

30Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Winfried Sabisch · Birkenfeld, DE
Alfred Kersch · Putzbrunn, DE
Georg Schulze-Icking · Ottobrunn, DE
Thomas Witke · Dresden, DE
Ralf Zedlitz · Dresden, DE

Key dates

Filing date	Jul 16, 2003
Grant date	Apr 4, 2006
Priority date	—
Expiry date	Jan 16, 2024

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3408
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.