Method for creating patterns for producing integrated circuits
US7024638B2 · kind B2 · utility
12Cited by
25References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2003 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Nov 4, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
To increase the writing speed of masks, context information can be used to distinguish the attributes of portions of the mask that are critical from attributes, and portions, that are less critical. By using this information, which may be derived from the design context of the features, the mask can be written at a higher speed without sacrificing the accuracy of the important attributes or features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.