Brush scrubbing-high frequency resonating substrate processing system
US7032269B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2005 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Sep 30, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate processing system is provided. The substrate processing system comprises a brush assembly that includes a core, a transducer, and a brush. The core is configured to include a plurality of orifices extending from a center of the brush core to an outer surface of the brush core. The transducer is configured to be disposed on an outer surface of the core. The transducer is capable of resonating at a high frequency. The brush includes a plurality of openings, and is configured to cover the transducer. When the transducer resonates at the high frequency, high energy acoustic energy is imparted from the transducer to a surface of a substrate to be prepared at a respective location of each opening of the plurality of openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.