Plasma processing apparatus, and electrode structure and table structure of processing apparatus
US7033444B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2000 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Apr 21, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber (26) in which a vacuum can be formed. An electrode unit (38) has a heater unit (44) therein. A cooling block (40) having a cooling jacket (58) is joined to the electrode unit (38) so as to cool the electrode unit. A heat resistant metal seal member (66A, 66B) seals an electrode-side heat transfer space (62, 64) formed between the electrode unit and the cooling block. Electrode-side heat transfer gas supply means (94) supplies a heat transfer gas to the electrode-side heat transfer space. Accordingly, a sealing characteristic of the electrode-side heat transfer space does not deteriorate even in a high temperature range such as a temperature higher than 200° C. and, for example, a range from 350° C. to 500° C., and the heat transfer gas does not leak.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.