Clamshell apparatus with crystal shielding and in-situ rinse-dry
US7033465B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2002 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | May 29, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D5/022
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Certain mechanisms of a plating apparatus address problems associated with interaction between plating solutions or other processing solutions and the components of the plating apparatus (such as the electrical contacts). For example, a circumferential spray skirt around the interface of a “cup” and “cone” in the plating apparatus protects these features during plating. A shield mechanism contacts the cup and/or cone at the periphery of their interface to provide a fluid resistant seal. In some cases, the cone includes an outer circumferential lip that engages a complementary surface of the cup for this purpose. Further, a mechanism is provided for raising and lowering the work piece with the cone in order to allow in situ rinsing of the work piece and/or regions of the cup.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.