Active hardmask for lithographic patterning
US7033739B2 · kind B2 · utility
2Cited by
1References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2003 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Aug 19, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.