Method and system for use in the monitoring of samples with a charged particle beam
US7034297B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2003 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Jun 9, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/20207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for use in monitoring a sample with a charged particle beam are presented. A mechanical displacement between a plane defined by the sample's surface and an optical axis defined by a beam directing arrangement is provided so as to orient the sample at a certain non-right angle θ1 with respect to the optical axis. A primary charged particle beam propagating towards the sample is deflected so as to affect the trajectory of the primary charged particle beam to provide a certain non-zero angle θ2 between the primary beam propagation axis and said optical axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.