Developing photoresist with supercritical fluid and developer
US7044662B2 · kind B2 · utility
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184References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 3, 2004 |
| Grant date | May 16, 2006 |
| Priority date | — |
| Expiry date | Oct 25, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.