Process for silylating photoresists in the UV range

US7045273B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Jens FERBITZ · Osnabrück, DE
• Werner Mormann · Zürich, CH
• Jens Rottstegge · Lilienthal, DE
• Christoph Hohle · Bubenreuth, DE
• Christian Eschbaumer · Arnstorf, DE
• Michael Sebald · Waischenfeld, DE

Key dates

• Filing date: Oct 31, 2002
• Grant date: May 16, 2006
• Expiry date: Dec 9, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/405
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A process for the amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The isocyanate group or the thiocyanate group in addition to the nucleophilic group form a reaction pair. One of the partners is provided on the polymer and the other partner on the amplification agent. The amplification reaction takes place more rapidly than a linkage to carboxylic anhydride groups. Furthermore, the amplification reaction permits the use of polymers that have high transparency at short wavelengths of less than 200 nm, in particular 157 nm.