Lithographic apparatus and device manufacturing method
US7050146B2 · kind B2 · utility
113Cited by
26References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2004 |
| Grant date | May 23, 2006 |
| Priority date | — |
| Expiry date | Apr 18, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.