Patent · US Expired

Reaction chamber with at least one HF feedthrough

US7056388B2 · kind B2 · utility

3Cited by

3References

9Claims

0Family size

Assignee

Aixtron, Inc. · DE

Inventors

Walter Franken · Eschweiler, DE
Gerd Strauch · Aachen, DE
Johannes Käppeler · Harsewinkel, DE
Holger Jurgensen · Aachen, DE

Key dates

Filing date	Oct 11, 2002
Grant date	Jun 6, 2006
Priority date	—
Expiry date	Mar 13, 2023

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32577
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A reaction chamber for carrying out substrate coating methods is disclosed, having at least one opening in at least one outer wall in which an HF feedthrough is inserted in a pressure or vacuum tight manner. The reaction chamber is further characterized by a combination of the following features: a support plate with coolant channels, and at least one opening for an HF line; an HF line collar in the zone disposed in the reaction chamber, a first seal on the collar; a first disc from an insulating material between a second seal on the support plate and the first seal on the collar; a thread in the zone outside the reaction chamber, a screw element being screwed onto the thread, all configured to prevent an electrical contact between the HF line and the support plate being established or an arc-over between the HF line and the support plate occurring.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.