Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system
US7060978B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2001 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Apr 30, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an electron-converting material. The target structure also includes either a non-converting material in a region remote from the optical axis or the region remote from the optical axis is offset in the direction of the optical axis with respect to the region near the optical axis that includes the electron-converting material. The detector system makes possible separate detection of only back-scattered electrons or only secondary electrons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.