Multi-charged beam lens and charged beam exposure apparatus using the same
US7060984B2 · kind B2 · utility
30Cited by
6References
16Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 2, 2004 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Aug 2, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3177
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multi-charged beam lens formed by stacking, via insulators, at least three substrates each having a plurality of apertures which pass charged beams. The lens includes a voltage application portion arranged on at least one of the at least three substrates. The voltage application portion and the insulators are connected via an insulating portion consisting of an oxide material in order to achieve electrical isolation between the voltage application portion and the insulators.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.