Method and apparatus for improved processing with a gas-cluster ion beam
US7060989B2 · kind B2 · utility
56Cited by
5References
23Claims
0Family size
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Key dates
| Filing date | Mar 18, 2005 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Mar 18, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3151
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus and methods for improving processing of workpieces with gas-cluster ion beams and modifying the gas-cluster ion energy distribution in the GCIB. In a reduced-pressure environment, generating an energetic gas-cluster ion beam and subjecting the beam to increased pressure region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.