Patent · US Expired

Exposure apparatus and method of cleaning optical element of the same

US7061576B2 · kind B2 · utility

0Cited by
28References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 8, 2001
Grant dateJun 13, 2006
Priority date—
Expiry dateJun 8, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70925
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An exposure apparatus includes a light source, which emits an exposure beam, an optical system including a casing and an optical element, the casing having a closed space and the optical element being disposed in the casing, a first supplier, which supplies an inert gas into the closed space, a second supplier, which supplies one of oxygen and clean air into the closed space and a controller, which changes a wavelength of the exposure beam between exposure of a substrate and cleaning of the optical element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.