Method and apparatus for monitoring and controlling imaging in immersion lithography systems
US7061578B2 · kind B2 · utility
18Cited by
12References
22Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 11, 2003 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Dec 24, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptable for exposing the wafer with the exposure pattern. Also disclosed is a monitoring and control system for an immersion lithography system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.