Maskless lithography systems and methods utilizing spatial light modulator arrays
US7061591B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2003 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Jun 22, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.