Darkfield inspection system having photodetector array
US7061598B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2002 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Sep 16, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8822
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A darkfield surface inspection tool of the invention includes an illumination source for illuminating a workpiece and generating a light scattering pattern. The light scattering pattern being configured such that the positions of the light beams of the scattering pattern are uniquely related to the scattering angles of the light beams as they are scattered from the workpiece. The tool also includes a photodetector array positioned at a detector surface to detect the light scattering pattern as it reaches the detector surface. The photodetector array produces an electrical signal that is received by signal processing electronics of the tool and can be used to characterize defects on the workpiece. The invention also includes darkfield surface inspection methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.