David W. Shortt
36Patents
11h-index
45Co-inventors
75Inventor score
Filing activity: Jun 6, 1990 → May 1, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6781688B2 | Process for identifying defects in a substrate having non-uniform surface properties | Physics | 48 | Expired |
| US7304310B1 | Methods and systems for inspecting a specimen using light scattered in different wavelength ranges | Physics | 45 | Expired |
| US9891177B2 | TDI sensor in a darkfield system | Physics | 43 | Active |
| US8582094B1 | Systems and methods for inspecting specimens including specimens that have a substantially rough uppermost layer | Physics | 23 | Active |
| US7002677B2 | Darkfield inspection system having a programmable light selection array | Physics | 18 | Expired |
| US6414752B1 | Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool | Physics | 18 | Expired |
| US9092846B2 | Detecting defects on a wafer using defect-specific and multi-channel information | Physics | 18 | Active |
| US7106432B1 | Surface inspection system and method for using photo detector array to detect defects in inspection surface | Physics | 16 | Expired |
| US7271921B2 | Method and apparatus for determining surface layer thickness using continuous multi-wavelength surface scanning | Physics | 14 | Expired |
| US7489393B2 | Enhanced simultaneous multi-spot inspection and imaging | Physics | 14 | Expired |
| US7463349B1 | Systems and methods for determining a characteristic of a specimen | Physics | 11 | Active |
| US5528366A | Precision determination for molecular weights | Physics | 10 | Expired |
| US7436505B2 | Computer-implemented methods and systems for determining a configuration for a light scattering inspection system | Physics | 9 | Active |
| US9390902B2 | Method and system for controlling convective flow in a light-sustained plasma | Electricity | 8 | Active |
| US7061598B1 | Darkfield inspection system having photodetector array | Physics | 8 | Expired |
| US7009696B2 | Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool | Physics | 8 | Expired |
| US8947521B1 | Method for reducing aliasing in TDI based imaging | Physics | 7 | Active |
| US7199874B2 | Darkfield inspection system having a programmable light selection array | Physics | 7 | Expired |
| US9558858B2 | System and method for imaging a sample with a laser sustained plasma illumination output | Physics | 7 | Active |
| US7554656B2 | Methods and systems for inspection of a wafer | Physics | 7 | Active |
| US10082470B2 | Defect marking for semiconductor wafer inspection | Physics | 6 | Active |
| US5121054A | Method and apparatus for determining the angular velocity of a shaft using a pair of proximity sensors | Physics | 4 | Expired |
| US9846930B2 | Detecting defects on a wafer using defect-specific and multi-channel information | Physics | 4 | Active |
| US7372559B2 | Systems and methods for inspecting a wafer with increased sensitivity | Physics | 3 | Active |
| US7697129B2 | Systems and methods for inspecting a wafer with increased sensitivity | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.