Patent · US Expired

Method of manufacturing an optical element using a hologram

US7061626B1 · kind B1 · utility

13Cited by
12References
35Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 14, 2004
Grant dateJun 13, 2006
Priority date
Expiry dateMay 14, 2024

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03H2001/0072
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of manufacturing an optical element having an optical surface of a target shape includes performing an interferometric test using an interferometer optics, wherein the interferometer optics includes a hologram that deflects a beam of measuring light by a substantial angle or that displaces an axis of symmetry of measuring light emerging from the hologram with respect to an axis of symmetry of measuring light incident on the hologram.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.