Generic interface for an optical metrology system
US7064829B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2003 |
| Grant date | Jun 20, 2006 |
| Priority date | — |
| Expiry date | Dec 10, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter that characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.