Extreme ultraviolet light source
US7067832B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2003 |
| Grant date | Jun 27, 2006 |
| Priority date | — |
| Expiry date | Jun 18, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/003
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target (22) with laser light from a driving laser device (25), and generates extreme ultraviolet (EUV) light with a wavelength of several nanometers to several tens of nanometers. The extreme ultraviolet light source device comprises a target supply device which has a charge applying unit (23) that applies a charge to the target (22), and an acceleration unit (24) which accelerates the charged target (22) using an electromagnetic field. The target supply device supplies the target (22) comprised of a rare gas element such as xenon (Xe) or the like, or a metal such as lithium (Li), tin (Sn), tin oxide (SnO2) or the like, as ionized molecules, atoms or masses comprising a plurality of atoms, or as ionized clusters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.