Enhancement of X-ray reflectometry by measurement of diffuse reflections
US7068753B2 · kind B2 · utility
21Cited by
35References
21Claims
0Family size
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Key dates
| Filing date | Jul 30, 2004 |
| Grant date | Jun 27, 2006 |
| Priority date | — |
| Expiry date | Oct 9, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B15/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.