Alignment systems for imprint lithography
US7070405B2 · kind B2 · utility
147Cited by
154References
45Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2002 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Apr 7, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2059/023
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.