Lithographic apparatus and device manufacturing method
US7072021B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2004 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Jun 28, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.