Method and system for dynamically adjusting metrology sampling based upon available metrology capacity
US7076321B2 · kind B2 · utility
9Cited by
36References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 5, 2004 |
| Grant date | Jul 11, 2006 |
| Priority date | — |
| Expiry date | Nov 24, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention is generally directed to various methods and systems for dynamically adjusting metrology sampling based upon available metrology capacity. In one illustrative embodiment, the method comprises providing a metrology control unit that is adapted to determine a baseline metrology sampling rate for at least one metrology operation, determining available metrology capacity, and providing the determined available metrology capacity to the metrology control unit wherein the metrology control unit determines a new metrology sampling rate based upon the determined available metrology capacity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.