Matthew A. Purdy
36Patents
12h-index
28Co-inventors
73Inventor score
Filing activity: Jan 20, 2000 → Sep 30, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6245581A | Method and apparatus for control of critical dimension using feedback etch control | Electricity | 126 | Expired |
| US6988045B2 | Dynamic metrology sampling methods, and system for performing same | Emerging Cross-Sectional Technologies | 42 | Expired |
| US7067333B1 | Method and apparatus for implementing competing control models | Physics | 39 | Expired |
| US6708129B1 | Method and apparatus for wafer-to-wafer control with partial measurement data | Electricity | 35 | Expired |
| US7131937B2 | Standing weightlifting apparatus | Human Necessities | 24 | Expired |
| US6133132A | Method for controlling transistor spacer width | Electricity | 21 | Expired |
| US6871114B1 | Updating process controller based upon fault detection analysis | Physics | 19 | Expired |
| US6740534B1 | Determination of a process flow based upon fault detection analysis | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6728591B1 | Method and apparatus for run-to-run control of trench profiles | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6790686B1 | Method and apparatus for integrating dispatch and process control actions | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6639663B1 | Method and apparatus for detecting processing faults using scatterometry measurements | Physics | 16 | Expired |
| US7296103B1 | Method and system for dynamically selecting wafer lots for metrology processing | Emerging Cross-Sectional Technologies | 12 | Expired |
| US7153709B1 | Method and apparatus for calibrating degradable components using process state data | Physics | 11 | Expired |
| US7100081B1 | Method and apparatus for fault classification based on residual vectors | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6409879B1 | System for controlling transistor spacer width | Electricity | 10 | Expired |
| US6978189B1 | Matching data related to multiple metrology tools | Electricity | 9 | Expired |
| US7460968B1 | Method and apparatus for selecting wafers for sampling | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7076321B2 | Method and system for dynamically adjusting metrology sampling based upon available metrology capacity | Electricity | 9 | Expired |
| US6365481B1 | Isotropic resistor protect etch to aid in residue removal | Electricity | 9 | Expired |
| US6562635B1 | Method of controlling metal etch processes, and system for accomplishing same | Electricity | 6 | Expired |
| US6991945B1 | Fault detection spanning multiple processes | Electricity | 6 | Expired |
| US6912436B1 | Prioritizing an application of correction in a multi-input control system | Physics | 6 | Expired |
| US6988225B1 | Verifying a fault detection result based on a process control state | Physics | 5 | Expired |
| US8676538B2 | Adjusting weighting of a parameter relating to fault detection based on a detected fault | Physics | 3 | Active |
| US6555397B1 | Dry isotropic removal of inorganic anti-reflective coating after poly gate etching | Emerging Cross-Sectional Technologies | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.