Light source device and exposure equipment using the same
US7078717B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 22, 2004 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Jun 1, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0082
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A light source device which has small etendue so that high power can be drawn out and which is subject to less damage by debris. The light source device for generating extreme ultra violet light by irradiating a target with a laser beam, includes a target supply unit for supplying a material which becomes the target; a laser unit including an oscillation stage laser having a lower-order transverse mode and at least one amplification stage laser for amplifying a lower-order transverse mode laser beam generated by the oscillation stage laser, for irradiating the target with the amplified laser beam to generate plasma; and a collection optical system for collecting the extreme ultra violet light emitted from the plasma to output the collected extreme ultra violet light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.