Illumination system and method allowing for varying of both field height and pupil
US7079321B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2004 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Mar 31, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70183
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system allow for changing (continuously or variably) both a field height and pupil of a beam that illuminates an object field. In one example, the object field can have a pattern generator (e.g., one or more reticles, spatial light modulators, or the like) positioned therein. The system and method for changing both the field height and the pupil can include a field defining element, a pupil defining element, and first and second zoom systems. The field defining element (FDE) can generate a field height of an illumination beam. The first zoom system can allow for changing of the field height of the illumination beam. The pupil defining element (PDE) can generate a pupil of the illumination beam. The second zoom system can allow for changing of the pupil of the illumination beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.