Lithographic apparatus and device manufacturing method
US7081943B2 · kind B2 · utility
171Cited by
19References
51Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2003 |
| Grant date | Jul 25, 2006 |
| Priority date | — |
| Expiry date | Nov 14, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.