Systems and methods for metrology recipe and model generation
US7089075B2 · kind B2 · utility
12Cited by
10References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 24, 2002 |
| Grant date | Aug 8, 2006 |
| Priority date | — |
| Expiry date | Sep 11, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B23/0216
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generator to generate setup information according to the unpatterned wafer measurement. The system then provides the setup information to a process measurement system for use in measuring production wafers in a semiconductor manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.