Single phase fluid imprint lithography method

US7090716B2 · kind B2 · utility

Assignees

• Molecular Imprints, Inc. · US
• The Board of Regents of the University of Texas System · US

Inventors

• Ian McMackin · Austin, US
• Nicholas A. Stacey · Austin, US
• Daniel Babbs · Austin, US
• Duane J. Voth · Austin, US
• Michael Watts · Austin, US
• Van Nguyen Truskett · Austin, US
• Frank Y. Xu · Round Rock, US
• Ronald D. Voisin · Austin, US
• Pankaj Lad · Austin, US

Key dates

• Filing date: Oct 2, 2003
• Grant date: Aug 15, 2006
• Expiry date: Mar 20, 2024

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S438/909
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.